Powering the Photovoltaic Revolution High-Purity Gases for Solar Cell Manufacturing INOXAP: Precision. Quality. Performance.
Why High-Purity Gases Matter •
Foundation for defect-free silicon deposition and higher efficiency
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Enable anti-reflective coatings that capture more sunlight
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Critical for precision doping and layer formation
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Ensure superior cell performance and long-term durability
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Drive yield optimization and manufacturing consistency
Deposition & Coating Technologies Silane (SiH₄) Silicon source for PECVD amorphous/polycrystalline layers; enables TOPCon anti-reflective coatings
Ammonia (NH₃) Forms Si₃N₄ anti-reflective coatings; boosts light capture and surface passivation
Nitrous Oxide (N₂O) Creates silicon oxide layers for passivation and optical stability
TMA (Trimethyl Aluminum) ALD precursor for Al₂O₃ passivation in PERC/TOPCon advanced cells
Doping & Plasma Etching Solutions n-Type Doping Phosphine (PH₃) + H₂ creates power-producing p-n junctions with precise concentration control
p-Type Doping Diborane (B₂H₆) + H₂ enables optimal boron introduction for charge-absorbing junctions
Plasma Etching Boron Trichloride (BCl₃) enables ultra-fine feature creation and surface preparation
Chamber Cleaning Nitrogen Trifluoride (NF₃) removes residues for pristine deposition surfaces
Supporting Gases & Next-Generation Cells Process Support Gases Ultra-High Purity O₂ enables thermal oxidation for passivation layers • Ultra-High Purity N₂ provides inert atmosphere during high-temperature processing • Hydrogen (H₂) serves as carrier, reducing agent, and defect passivation
Advanced Applications Methane (CH₄) pioneers carbon-based films and graphene layers for tandem and multi-junction solar cells with enhanced durability
Why INOXAP for Solar Manufacturing? The complex symphony of gases requires a partner with unwavering commitment to:
✓ Safety & Precision ✓ Unmatched Quality & Consistency ✓ Peak Efficiency & Manufacturing Yield ✓ Superior Cell Performance
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